The University of Tokyo Institute for Nano Quantum Information Electronics Quantum Dot Laboratory

Equipment for growth process

MOCVD system for GaAs

Group III: TMG TMA TMI TEG TEA
Group V: TBA AsH3 TBP
Dopant: SiH4 DEZ
MOCVD system for GaN

Group III: TMG TMA TMI
Group V: NH3
Dopant: SiH4 Cp2Mg
MOCVD system for GaInNAs

Group III: TMG TMA TMI TEG
Group V: NH3 TBA TBP DMHy
Dopant: CBr4 DMZn
Group III: TMG TMA TMI
MBE system I

Group III: Al Ga In
Group V: N As Sb
dopant: Si Be
MBE system II

Group III: Al Ga In
Group V: N
dopant: Si Mg
Scanning Tunneling Microscope system located inside MBE growth chamber
Organic device fabrication system

(From left side ...)
Sputtering Chamber
Pretreatment Chamber
Organic Chamber
Electrode Chamber